VALUE PROPOSITION
Multiple products have a need for precise surface treatment and thin film deposition with enhanced performance, durability, and efficiency. Various products, from semiconductor devices and solar panels to sensors could benefit. By providing tailored surface properties and superior control over material deposition, ion sources contribute to improved functionality, reduced manufacturing costs, and extended product lifecycles. Improved technology empowers manufacturers to develop solutions that meet the evolving demands of their respective markets, ultimately driving innovation and competitive advantage.
DESCRIPTION OF TECHNOLOGY
This ion source technology is a cutting-edge surface treatment and thin film deposition method that modifies the surface properties of materials. By employing high-energy ions, this technique enables precise control over the deposition process, allowing for the creation of tailored surface characteristics, such as improved adhesion, conductivity, or wear resistance. The versatility of this ion source technology makes it applicable across various industries, including electronics, solar energy, automotive, and aerospace, where enhanced performance and durability are critical. The technology is a cost-effective and efficient alternative to traditional surface treatment methods.
BENEFITS
APPLICATIONS
IP Status
US Patent 12,165,829
LICENSING RIGHTS AVAILABLE
All Licensing rights available
Inventors: Qi Hua Fan
Tech ID: TEC2019-0123
For more information about this technology,
Contact Ken Foster, Ph.D. at foste462@msu.edu or +1-517-884-0719